Browsing by Author "Miloslavsky, Alex"
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Publication Design compliance for Spacer Is Dielectric (SID) patterning
Proceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.83260DPublication Double patterning OPC and design for 22nm to 16nm device nodes
;Lucas, Kevin ;Cork, Chris ;Miloslavsky, Alex ;Luk-Pat, Gerry ;Li, Xiaohai ;Barnes, LeviGao, WeiminProceedings paper2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009Publication EDA perspective on manufacturable DPT solutions
Oral presentation2010, 7th Annual LithoVision Technical SymposiumPublication Interactions of double patterning technology with wafer processing, OPC and design flows
;Lucas, Kevin ;Cork, Chris ;Miloslavsky, Alex ;Luk-Pat, Gerry ;Barnes, LeviHapli, JohnProceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.692403Publication Physical design and mask synthesis considerations for DPT
Proceedings paper2008, SEMATECH Litho Forum, 13/05/2008Publication Physical design and mask synthesis considerations for DPT
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008