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Browsing by Author "Miloslavsky, Alex"

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    Design compliance for Spacer Is Dielectric (SID) patterning

    Luk-Pat, Gerard
    ;
    Miloslavsky, Alex
    ;
    Painter, Ben
    ;
    Lin, Li
    ;
    De Bisschop, Peter  
    ;
    Lucas, Kevin
    Proceedings paper
    2012, Optical Microlithography XXV, 12/02/2012, p.83260D
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    Double patterning OPC and design for 22nm to 16nm device nodes

    Lucas, Kevin
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    Cork, Chris
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    Miloslavsky, Alex
    ;
    Luk-Pat, Gerry
    ;
    Li, Xiaohai
    ;
    Barnes, Levi
    ;
    Gao, Weimin
    Proceedings paper
    2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009
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    EDA perspective on manufacturable DPT solutions

    Wiaux, Vincent  
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    Gao, Weimin
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    Lucas, Kevin
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    Cork, Chris
    ;
    Luk-Pat, Gerry
    ;
    Miloslavsky, Alex
    Oral presentation
    2010, 7th Annual LithoVision Technical Symposium
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    Interactions of double patterning technology with wafer processing, OPC and design flows

    Lucas, Kevin
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    Cork, Chris
    ;
    Miloslavsky, Alex
    ;
    Luk-Pat, Gerry
    ;
    Barnes, Levi
    ;
    Hapli, John
    Proceedings paper
    2008, Optical Microlithography XXI, 24/02/2008, p.692403
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    Physical design and mask synthesis considerations for DPT

    Lucas, Kevin
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    Cork, Chris
    ;
    Hapli, John
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    Miloslavsky, Alex
    ;
    Wiaux, Vincent  
    ;
    Verhaegen, Staf
    Proceedings paper
    2008, SEMATECH Litho Forum, 13/05/2008
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    Physical design and mask synthesis considerations for DPT

    Lucas, Kevin
    ;
    Cork, Chris
    ;
    Hapli, John
    ;
    Miloslavsky, Alex
    ;
    Wiaux, Vincent  
    ;
    Verhaegen, Staf
    Proceedings paper
    2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008

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