Browsing by Author "Montgomery, Patrick K."

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Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node

Montgomery, Patrick K.
;
Litt, Lloyd
;
Conley, Will
;
Lucas, Kevin
;
van Wingerden, Johannes
Journal article
2004, Journal of Microlithography, Microfabrication and Microsystems, (3) 2, p.276-283
Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode

Montgomery, Patrick K.
;
Lucas, Kevin D.
;
Litt, Lloyd C.
;
Conley, Will
;
Fanucchi, Eric
Proceedings paper
2003-12, 23rd Annual BACUS Symposium on Photomask Technology, 8/09/2003, p.814-825