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Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode
Publication:
Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode
Date
2003-12
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Montgomery, Patrick K.
;
Lucas, Kevin D.
;
Litt, Lloyd C.
;
Conley, Will
;
Fanucchi, Eric
;
van Wingerden, Johannes
;
Vandenberghe, Geert
;
Wiaux, Vincent
;
Taylor, Darren
;
Cangemi, Michael J.
;
Kasprowicz, Bryan
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1856
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
1856
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations