Publication:

Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode

Date

2003-12
Proceedings Paper
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dc.contributor.authorMontgomery, Patrick K.
dc.contributor.authorLucas, Kevin D.
dc.contributor.authorLitt, Lloyd C.
dc.contributor.authorConley, Will
dc.contributor.authorFanucchi, Eric
dc.contributor.authorvan Wingerden, Johannes
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorWiaux, Vincent
dc.contributor.authorTaylor, Darren
dc.contributor.authorCangemi, Michael J.
dc.contributor.authorKasprowicz, Bryan
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorWiaux, Vincent
dc.date.accessioned2021-10-15T05:46:51Z
dc.date.available2021-10-15T05:46:51Z
dc.date.issued2003-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7912
dc.source.beginpage814
dc.source.conference23rd Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate8/09/2003
dc.source.conferencelocationMonterey, Ca USA
dc.source.endpage825
dc.title

Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode

dc.typeProceedings paper
dspace.entity.typePublication
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