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Browsing by Author "Neumann, J.T."

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    Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells

    Bekaert, Joost  
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    Laenens, Bart
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    Verhaegen, Staf
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    Van Look, Lieve  
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    Trivkovic, Darko  
    Proceedings paper
    2010, Optical Microlithography XXIII, 21/02/2010, p.764008
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    High-throughput multi-beam SEM: quantitative analysis of imaging capabilities at imec-N10 logic node

    Neumann, J.T.
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    Garbowski, T.
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    Högele, W.
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    Korb, T.
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    Halder, Sandip  
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    Leray, Philippe  
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    Garreis, R.
    Proceedings paper
    2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 25/02/2017, p.101451S
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    Imaging semiconductor patterns at N10 logic node with a high-throughput multi-beam SEM

    Neumann, J.T.
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    Garaboski, T.
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    Halder, Sandip  
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    Leray, Philippe  
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    Garreis, R.
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    Zeidler, D.
    Meeting abstract
    2016, 60th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - EIPBN, 31/05/2016, p.3B3

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