Browsing by Author "Nikolsky, Peter"
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Publication Feasibility study of the approach to Flare, shadowing, optical and process corrections for EUVL OPC
Proceedings paper2009-09, Photomask Technology 2009, 14/09/2009, p.74882NPublication Imaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer
Proceedings paper2013, 29th European Mask and Lithography Conference, 25/06/2013, p.88860NPublication Litho and patterning challenges for memory and logic applications at the 22nm node
Proceedings paper2010, Optical Microlithography XXIII, 21/02/2010, p.76400C