Browsing by Author "Novikova, N."

Now showing 1 - 4 of 4

F atoms interaction with nanoporous OSG low-k materials

Rakhimova, T.
;
Rakhimov, A.
;
Zyryanov, S.
;
Lopaev, D.
;
Mankelevich, Y.
;
Proshina, O.
;
Novikova, N.
Meeting abstract
2014, MRS Spring Meeting Symposium CC: New Materials and Processes for Interconnects, Novel Memory and Advanced Display Technologies, 15/03/2014, p.CC1.03-283
Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage

Rakhimova, T.
;
Lopaev, D.
;
Mankelevich, Y.
;
Rakhimov, A.
;
Zyryanov, S.
;
Kurchikov, K.
;
Novikova, N.
Journal article
2015, Journal of Physics D: Applied Physics, (48) 17, p.175203
Low-k OSG damage and etching by F atoms at lowered temperatures

Zyryanov, S.
;
Kurchikov, D.
;
Lopaev, D.
;
Mankelevich, Y.
;
Palov, A.
;
Rakhimova, T.
;
Voronina, E.
Oral presentation
2015, 22nd International Symposium on Plasma Chemistry - ISPC
Modification of OSG based low-k films under EUV and VUV exposure

Rakhimova, T.
;
Rakhimov, A.
;
Mankelevich, Y.
;
Lopaev, D.
;
Kovalev, A.
;
Vasil'eva, A.
;
Proshina, O.
Journal article
2013, Applied Physics Letters, 102, p.111902