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Modification of OSG based low-k films under EUV and VUV exposure
Publication:
Modification of OSG based low-k films under EUV and VUV exposure
Date
2013
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Rakhimova, T.
;
Rakhimov, A.
;
Mankelevich, Y.
;
Lopaev, D.
;
Kovalev, A.
;
Vasil'eva, A.
;
Proshina, O.
;
Braginsky, O.
;
Zyryanov, S.
;
Kurchikov, K.
;
Novikova, N.
;
Baklanov, Mikhaïl
Journal
Applied Physics Letters
Abstract
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Metrics
Views
1929
since deposited on 2021-10-21
411
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations