Publication:

Modification of OSG based low-k films under EUV and VUV exposure

Date

2013
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorRakhimova, T.
dc.contributor.authorRakhimov, A.
dc.contributor.authorMankelevich, Y.
dc.contributor.authorLopaev, D.
dc.contributor.authorKovalev, A.
dc.contributor.authorVasil'eva, A.
dc.contributor.authorProshina, O.
dc.contributor.authorBraginsky, O.
dc.contributor.authorZyryanov, S.
dc.contributor.authorKurchikov, K.
dc.contributor.authorNovikova, N.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-21T11:15:16Z
dc.date.available2021-10-21T11:15:16Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22976
dc.identifier.urlhttp://apl.aip.org/resource/1/applab/v102/i11/p111902_s1
dc.source.beginpage111902
dc.source.journalApplied Physics Letters
dc.source.volume102
dc.title

Modification of OSG based low-k films under EUV and VUV exposure

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
26214.pdf
Size:
882.26 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles