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Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage
Publication:
Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage
Date
2015
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Rakhimova, T.
;
Lopaev, D.
;
Mankelevich, Y.
;
Rakhimov, A.
;
Zyryanov, S.
;
Kurchikov, K.
;
Novikova, N.
;
Baklanov, Mikhaïl
Journal
Journal of Physics D: Applied Physics
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1925
since deposited on 2021-10-22
417
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Acq. date: 2025-10-25
Citations
Metrics
Views
1925
since deposited on 2021-10-22
417
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations