Publication:
Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage
Date
| dc.contributor.author | Rakhimova, T. | |
| dc.contributor.author | Lopaev, D. | |
| dc.contributor.author | Mankelevich, Y. | |
| dc.contributor.author | Rakhimov, A. | |
| dc.contributor.author | Zyryanov, S. | |
| dc.contributor.author | Kurchikov, K. | |
| dc.contributor.author | Novikova, N. | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.date.accessioned | 2021-10-22T22:05:49Z | |
| dc.date.available | 2021-10-22T22:05:49Z | |
| dc.date.issued | 2015 | |
| dc.identifier.issn | 0022-3727 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25797 | |
| dc.identifier.url | http://iopscience.iop.org/0022-3727/48/17/175203/ | |
| dc.source.beginpage | 175203 | |
| dc.source.issue | 17 | |
| dc.source.journal | Journal of Physics D: Applied Physics | |
| dc.source.volume | 48 | |
| dc.title | Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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