Browsing by Author "O'Toole, Martin"
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Publication First demonstration of Two Metal Level Semi-damascene Interconnects with Fully Self-aligned Vias at 18MP
Proceedings paper2022, VLSI Technology and Circuits, 12-17 June 2022Publication High NA: Enabling Single Exposure for Metal Logic Designs
Proceedings paper2026, Optical and EUV Nanolithography XXXIX,, 2026-02-22, p.139791EPublication Inflection points in interconnect research and trends for 2nm and beyond in order to solve the RC bottleneck
Proceedings paper2020, IEEE International Electron Devices Meeting (IEDM), DEC 12-18, 2020Publication Patterning of Ru metal lines at 18 nm pitch
Proceedings paper2022, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2020-2022, p.1205604