Browsing by Author "Ogawa, Yuichi"
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Publication Dissolution of germanium in sulfuric acid based solutions
Proceedings paper2015, 14th International Symposium On Semiconductor Cleaning Science And Technology - SCST 14, 11/10/2015, p.277-284Publication Effect of dilute hydrogen peroxide in ultrapure water on SiGe epitaxial process
Proceedings paper2016, Ultra Clean Processing of Semiconductor Surfaces XIII, 11/09/2016, p.27-30Publication Impact of hydrogen peroxide in ultrapure water
;Ogawa, Yuichi ;Masaoka, Toru ;Gan, Nobuko ;Fujimura, Yu ;Minato, YasuharuMiyazaki, YoichiProceedings paper2017, Surface Preparation and Cleaning Conference - SPCC, 27/03/2017, p.91-101Publication Study of cobalt etch control by pH and oxidizer
Meeting abstract2018, Surface Preparation and Cleaning Conference - SPCC, 9/04/2018Publication Study on La2O3 wet clean by pH controlled functional water
Proceedings paper2019, 16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16), 13/10/2019, p.21-26Publication Study on La2O3 wet clean by pH controlled functional water
Meeting abstract2019, ECS Fall Meeting G01-16th International Symposium on Semiconductor Cleaning Science and Technology (SCST 16), 13/10/2019, p.1094