Browsing by Author "Okawa, Tatsuro"
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Publication High-NA EUV Mask CD-SEM Metrology Matching, and Contour-based Comparison of Simulation Result and Wafer Print
Proceedings paper2025, Photomask Technology, 2025-09-22, p.1368713Publication High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology
Proceedings paper2024, 39th European Mask and Lithography Conference (EMLC), JUN 17-19, 2024, p.Art. 132730S