Publication:

High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

Date

2024

Proceedings Paper

https://doi.org/10.1117/12.3029528

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Author(s)

;

Baskaran, Balakumar

;

Van Look, Lieve

;

Franke, Joern-Holger

;

Philipsen, Vicky

;

Niroomand, Ardavan

;

Hendrickx, Eric

;

Komami, Hideaki

;

;

;

Kojima, Shinichi

;

Iwai, Toshimichi

Journal

Proceedings of SPIE

Statistics

168 since deposited on 2024-11-16

Acq. date: 2026-02-26