High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

Bekaert, Joost; Baskaran, Balakumar; Van Look, Lieve; Franke, Joern-Holger; Philipsen, Vicky; Niroomand, Ardavan; Hendrickx, Eric; Komami, Hideaki; Okawa, Tatsuro; Shida, Soichi; Kojima, Shinichi; Iwai, Toshimichi

doi:10.1117/12.3029528

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High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

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2024

Proceedings Paper

https://doi.org/10.1117/12.3029528

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Proceedings of SPIE

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167 since deposited on 2024-11-16

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Acq. date: 2025-12-10

High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

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