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High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

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dc.contributor.authorBekaert, Joost
dc.contributor.authorBaskaran, Balakumar
dc.contributor.authorVan Look, Lieve
dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorKomami, Hideaki
dc.contributor.authorOkawa, Tatsuro
dc.contributor.authorShida, Soichi
dc.contributor.authorKojima, Shinichi
dc.contributor.authorIwai, Toshimichi
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorBaskaran, Balakumar
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorNiroomand, Ardavan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecBaskaran, Balakumar::0000-0002-5651-7768
dc.contributor.orcidimecVan Look, Lieve::0009-0000-6198-024X
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.accessioned2025-06-20T08:51:04Z
dc.date.available2024-11-16T16:49:19Z
dc.date.available2025-06-20T08:51:04Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3029528
dc.identifier.eisbn978-1-5106-8289-4
dc.identifier.isbn978-1-5106-8288-7
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44791
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 132730S
dc.source.conference39th European Mask and Lithography Conference (EMLC)
dc.source.conferencedateJUN 17-19, 2024
dc.source.conferencelocationGrenoble
dc.source.journalProceedings of SPIE
dc.source.numberofpages13
dc.source.volume13273
dc.title

High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

dc.typeProceedings paper
dspace.entity.typePublication
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