Browsing by Author "Park, Jin-Goo"
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Publication Acidic cleaning solutions for post InGaAs CMP cleaning
;Park, Jin-Goo ;Purushothaman, Muthukrishnan ;Lee, Jung-Hwan ;Choi, In-chanKim, Hyun-TaeProceedings paper2018-04, 20th Surface Preparation and Cleaning Conference - SPCC 2018, 9/04/2018Publication Analyzing the collapse force determined using lateral force AFM using
Meeting abstract2008, Ultra Clean Processing of Semiconductor Surfaces 2008, 22/09/2008Publication Analyzing the collapse force determined using lateral force AFM using mechanics theory
Oral presentation2008, 9th International Symposium on Ultra Clean Processing Of Semiconductor SurfacesPublication Analyzing the collapse force of narrow lines measured by lateral force AFM using an analytical mechanical model
Journal article2009, Solid State Phenomena, 145-146, p.55-58Publication Collapse behavior and forces of multistack nanolines
Journal article2010, Nanotechnology, (21) 1, p.15708Publication Development of post InGaAs CMP cleaning process for sub 10 nm device application
Meeting abstract2017-10, International Conference on Planarization/CMP Technology - ICPT, 11/10/2017Publication Development of post InGaAs CMP cleaning process for sub 10nm device application
Proceedings paper2017-10, International Conference on Planarization/CMP Technology - ICPT, 11/10/2017Publication Effect of ammonium halide salts on wet chemical nanoscale etching and polishing of InGaAs surfaces for advanced CMOS devices
Journal article2023, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, (161) July, p.Art. 07469Publication Effects of H2O2 and pH on the Chemical Mechanical Planarization of Molybdenum
Journal article2021, ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, (10) 9, p.094001Publication Effects of interfacial strength and dimension of structures on physical cleaning window
;Kim, Tae-Gon; ; ; ; ;Arstila, KaiPark, Jin-GooMeeting abstract2010, 10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS, 19/10/2010, p.10-11Publication Investigation of physical cleaning process window by atomic force microscope
Meeting abstract2009-10, 216th ECS Meeting, 5/10/2009, p.2079Publication Pattern collapse and particle removal forces of interest to semiconductor fabrication process
Journal article2009, Solid State Phenomena, 145-146, p.47-50Publication Quantitative measurement of pattern collapse and particle removal force
Proceedings paper2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.123-129Publication Tackling the challenges of physical cleaning
Oral presentation2008, 8th International Surface Cleaning Users Group Meeting Cleaning Technology Symposium