Browsing by Author "Park, Min Hyuk"
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Publication Effect of annealing ferroelectric HfO2 thin films: In situ, high temperature X-ray diffraction
Journal article2018, Advanced Electronic Materials, (4) 7, p.1800091-1-1800091-10Publication Reliability of HfO2-based FeFET memory
Journal article review2025-09-16, MRS BULLETIN, (50) 9, p.1053-1065