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Browsing by Author "Porti, M."

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    Comparison of standard macroscopic and conductive atomic force microscopy leakage measurements on gate removed high-k capacitors

    Polspoel, Wouter
    ;
    Vandervorst, Wilfried  
    ;
    Aguilera, L.
    ;
    Porti, M.
    ;
    Nafria, M.
    ;
    Aymerich, X.
    Journal article
    2009, Journal of Vacuum Science and Technology B, (27) 1, p.356-359
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    Electrical characterization of high-dielectric-constant/SiO2 metal-oxide-semiconductor gate stacks by a conductive atomic force microscope

    Blasco, X.
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    Porti, M.
    ;
    Nafria, M.
    ;
    Petry, Jasmine
    ;
    Vandervorst, Wilfried  
    Journal article
    2005, Nanotechnology, (16) 9, p.1506-1511
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    Nanoscale electrical characterization of HfO2/SiO2/MOS gate stackx with enhanced-CAFM

    Nafria, M.
    ;
    Blasco, X.
    ;
    Porti, M.
    ;
    Aguilera, L.
    ;
    Aymerich, X.
    ;
    Petry, Jasmine
    Proceedings paper
    2005, Spanish Conference on Electron Devices, 2/02/2005, p.65-68

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