Browsing by Author "Proshina, Olga"

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1-D model of RF CCP discharge in Ar/CF4/CF3I gas mixtures

Proshina, Olga
;
Rakhimova, Tatyana
;
Baklanov, Mikhaïl
Meeting abstract
2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013
Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching

Zotovich, Alexey
;
El Otell, Ziad
;
de Marneffe, Jean-Francois
;
Proshina, Olga
;
Lopaev, Dimitri
Journal article
2016, Plasma Sources Science and Technology, (25) 5, p.55001
Experimental and theoretical studies of radical production in RF CCP discharge at 81-MHz frequency in Ar/CF4 and Ar/CHF3 mixtures

Rakhimova, Tatyana
;
Braginsky, OLEG
;
Klopovskiy, Konstantin
;
Kovalev, Alexander
Journal article
2009, IEEE Transactions on Plasma Science, (37) 9, p.1683-1696