Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching

Publication:

2016

Journal article

Author(s)

;

;

;

;

;

;

Plasma Sources Science and Technology

1905 since deposited on 2021-10-23

1last month

1last week

Acq. date: 2026-10-04