Publication:
Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Date
| dc.contributor.author | Zotovich, Alexey | |
| dc.contributor.author | El Otell, Ziad | |
| dc.contributor.author | de Marneffe, Jean-Francois | |
| dc.contributor.author | Proshina, Olga | |
| dc.contributor.author | Lopaev, Dimitri | |
| dc.contributor.author | Rakhimova, Tatyana | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.imecauthor | El Otell, Ziad | |
| dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
| dc.date.accessioned | 2021-10-23T18:00:22Z | |
| dc.date.available | 2021-10-23T18:00:22Z | |
| dc.date.issued | 2016 | |
| dc.identifier.issn | 0963-0252 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27680 | |
| dc.identifier.url | http://iopscience.iop.org/article/10.1088/0963-0252/25/5/055001/meta | |
| dc.source.beginpage | 55001 | |
| dc.source.issue | 5 | |
| dc.source.journal | Plasma Sources Science and Technology | |
| dc.source.volume | 25 | |
| dc.title | Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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