Browsing by Author "Puurunen, R."
Now showing 1 - 3 of 3
- Results per page
- Sort Options
Publication ALD deposition of high-k and metal gate stacks for advanced CMOS applications
Proceedings paper2004, Atomic Layer Deposition Conference, 16/08/2004Publication Atomic layer deposition of hafnium oxide on germanium substrates
Journal article2005, J. Applied Physics, (97) 6, p.64104Publication The future of high-k on pure germanium and its importance for Ge CMOS
Journal article2005, Materials Science in Semiconductor Processing, (8) 1_3, p.203-207