Browsing by Author "Rathsack, Benjamin"
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Publication Effect of PAG distribution on ArF and EUV resist performance
Journal article2009, Journal of Photopolymer Science and Technology, (22) 1_6, p.97-104Publication EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Oral presentation2010, 54th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBNPublication EUV RLS performance tradeoffs for a polymer bound PAG resist
Proceedings paper2010, Advances in Resist Materials and Processing Technology XXVII, 21/02/2010, p.76390MPublication Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727347Publication Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13017