Browsing by Author "Raymondson, Daisy"
Now showing 1 - 2 of 2
- Results Per Page
- Sort Options
Publication Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Oral presentation2021-02-22, SPIE Advanced Lithography 2021, Novel Patterning TechnologiesPublication Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source
Proceedings paper2021, SPIE Advanced Lithography Novel Patterning Technologies 2021, 22/02/2021