Browsing by Author "Romeo, C."

Now showing 1 - 3 of 3

Application of a new approach to optical proximity correction

Rosenbusch, A.
;
Hourd, A.
;
Juffermans, Casper
;
Kirsch, H.
;
Lalanne, F.
;
Maurer, W.
;
Romeo, C.
Proceedings paper
1999, Optical Microlithography XII, 17/03/1999, p.639-647
Lithographic performance of 193 nm resist

Goethals, Mieke
;
Pollers, Ingrid
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Van Roey, Frieda
;
Sugihara, Takashi
;
Ronse, Kurt
;
Heskamp, B.
Proceedings paper
1998, 193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book, 14/09/1998, p.P-020
New approach to optical proximity correction

Rosenbusch, A.
;
Hourd, A.
;
Juffermans, C.
;
Kirsch, H.
;
Lalanne, F.
;
Maurer, W.
;
Romeo, C.
;
Ronse, Kurt
Proceedings paper
1998, 18th Annual Bacus Symposium on Photomask Technology and Management, 16/09/1998, p.585-593