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Browsing by Author "Rosslee, Craig"

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    Analysis of the effect of point-of-use filtration on microbridging defectivity

    Braggin, Jennifer
    ;
    Gronheid, Roel  
    ;
    Cheng, Shaunee
    ;
    Van Den Heuvel, Dieter  
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    Bernard, Sophie
    Proceedings paper
    2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.72730S
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    Characterizing immersion lithography micro bridge defects using advanced features of teh SEMVision G3 STAR FIB

    Van Den Heuvel, Dieter  
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    Santoro, Gaetano  
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    Gronheid, Roel  
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    Braggin, Jennifer
    ;
    Rosslee, Craig
    Proceedings paper
    2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009
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    Cluster optimization to improve total CD control as an enabler for double patterning

    Laidler, David  
    ;
    D'have, Koen  
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    Rosslee, Craig
    ;
    Tedeschi, Len
    Proceedings paper
    2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008
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    Micro-bridge defects: characterization and root cause analysis

    Santoro, Gaetano  
    ;
    Van Den Heuvel, Dieter  
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    Braggin, Jennifer
    ;
    Rosslee, Craig
    ;
    Leray, Philippe  
    Proceedings paper
    2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.763820
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    Track optimization and control for 32nm node double patterning and beyond

    Laidler, David  
    ;
    Rosslee, Craig
    ;
    D'have, Koen  
    ;
    Leray, Philippe  
    ;
    Tedeschi, Len
    Proceedings paper
    2009, Metrology, Inspection, and Process Control for Microlithography XXIII, 22/02/2009, p.727236

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