Browsing by Author "Schmoeller, T."

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Accurate EUV lithography simulation enabled by calibrated physical resist models

Klostermann, U.K.
;
Mulders, T.
;
Schmoeller, T.
;
Demmerle, W.
;
Lorusso, Gian
;
Hendrickx, Eric
Journal article
2010-09, Solid State Technology
Investigation of mask defectivity in full field EUV lithography

Jonckheere, Rik
;
Iwamoto, Fumio
;
Lorusso, Gian
;
Goethals, Mieke
;
Ronse, Kurt
;
Koop, H.
Proceedings paper
2007, SPIE Photomask Technology (BACUS), 17/09/2007, p.673012