Browsing by Author "Schuhmacher, M."
Now showing 1 - 2 of 2
- Results per page
- Sort Options
Publication Electrical characterization of capacitors with AVD- deposited hafnium silicates as high-k gate dielectric
Journal article2005, Journal of the Electrochemical Society, (152) 11, p.F185-F189Publication Improving CMOS performance by AVD® grown high-k dielectrics and advanced metal electrodes
Proceedings paper2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.293