Repository logo Institutional repository
  • Communities & Collections
  • Browse
  • Site
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Shamma, Nader"

Filter results by typing the first few letters
Now showing 1 - 2 of 2
  • Results Per Page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Integrated approach to improving local CD uniformity in EUV patterning

    Liang, Andrew
    ;
    Hermans, Jan  
    ;
    Tran, Tim
    ;
    Viatkina, Katja
    ;
    Liang, Chen-Wei
    ;
    Ward, Brandon
    Proceedings paper
    2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.1014319
  • Loading...
    Thumbnail Image
    Publication

    Overlay Metrology Performance of Dry Photoresist Towards High NA EUV Lithography

    Canga, Eren  
    ;
    Blanco, Victor  
    ;
    Charley, Anne-Laure  
    ;
    Tabery, Cyrus
    ;
    Zacca, Gabriel
    ;
    Shamma, Nader
    Proceedings paper
    2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.Art. 129551R

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings