Browsing by Author "Shimada, Ryo"

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Calibrated PSCAR stochastic simulation

Dinh, Cong Que
;
Nagahara, Seji
;
Shiraishi, Gousuke
;
Minekawa, Yukie
;
Kamei, Yuya
Proceedings paper
2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109571O
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Cong Que Dinh
;
Nagahara, Seiji
;
Yoshida, Keisuke
;
Kondo, Yoshihiro
;
Muramatsu, Makoto
Proceedings paper
2021, Conference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference, FEB 22-26, 2021, p.116120L
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

Nagahara, Seiji
;
Carcasi, Michael
;
Shiraishi, Gosuke
;
Nakagawa, Hisashi
;
Dei, Satoshi
Proceedings paper
2017, Advances in Patterning Materials and Processes XXXIV, 26/02/2017, p.101460G