Publication:

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2583922
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Author(s)

Cong Que Dinh
;
Nagahara, Seiji
;
Yoshida, Keisuke
;
Kondo, Yoshihiro
;
Muramatsu, Makoto
;
Yoshihara, Kosuke
;
Shimada, Ryo
;
Moriya, Teruhiko
;
Nafus, Kathleen
;
Petersen, John  
;
De Simone, Danilo  
;
Foubert, Philippe  
;
Vandenberghe, Geert  

Journal

Proceedings of SPIE

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1349 since deposited on 2022-09-08
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1349 since deposited on 2022-09-08
4last month
Acq. date: 2026-01-25

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