EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Cong Que Dinh; Nagahara, Seiji; Yoshida, Keisuke; Kondo, Yoshihiro; Muramatsu, Makoto; Yoshihara, Kosuke; Shimada, Ryo; Moriya, Teruhiko; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert

doi:10.1117/12.2583922

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EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Date

2021

Proceedings Paper

https://doi.org/10.1117/12.2583922

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Proceedings of SPIE

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Acq. date: 2026-05-03

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

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