Publication:

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2583922
Simple item page Full metadata Statistics
 
dc.contributor.authorCong Que Dinh
dc.contributor.authorNagahara, Seiji
dc.contributor.authorYoshida, Keisuke
dc.contributor.authorKondo, Yoshihiro
dc.contributor.authorMuramatsu, Makoto
dc.contributor.authorYoshihara, Kosuke
dc.contributor.authorShimada, Ryo
dc.contributor.authorMoriya, Teruhiko
dc.contributor.authorNafus, Kathleen
dc.contributor.authorPetersen, John
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorFoubert, Philippe
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorPetersen, John
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2023-01-19T12:55:32Z
dc.date.available2022-09-08T02:39:18Z
dc.date.available2023-01-19T12:55:32Z
dc.date.issued2021
dc.identifier.doi10.1117/12.2583922
dc.identifier.eisbn978-1-5106-4058-0
dc.identifier.isbn978-1-5106-4057-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40390
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage116120L
dc.source.conferenceConference on Advances in Patterning Materials and Processes XXXVIII Part of SPIE Advanced Lithography Conference
dc.source.conferencedateFEB 22-26, 2021
dc.source.conferencelocationVirtual
dc.source.journalProceedings of SPIE
dc.source.numberofpages6
dc.source.volume11612
dc.title

EUV resist performance enhancement by UV flood exposure for high NA EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions