Browsing by Author "Shimamoto, Y."
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Publication High-k gate stack engineering – towards meeting low standby power and high performance targets
; ; ; ; Proceedings paper2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.109-117Publication High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies
Proceedings paper2003, CMOS Front-End Materials and Process Technology, 21/04/2003, p.47-58Publication Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey
Journal article2005-01, Microelectronics Reliability, (45) 5_6, p.786-789Publication Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey
Proceedings paper2004, 13th Workshop on Dielectrics in Microelectronics - WODIM, 28/06/2004Publication Scaling of Hf-based high-k dielectrics
Meeting abstract2004, International Workshop on Dielectric Thin Films for Future ULSI Devices, 26/05/2004, p.5-6