Browsing by Author "Shiozawa, Takahiro"

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Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

Nagahara, Seiji
;
Carcasi, Michael
;
Shiraishi, Gosuke
;
Nakagawa, Hisashi
;
Dei, Satoshi
Proceedings paper
2017, Advances in Patterning Materials and Processes XXXIV, 26/02/2017, p.101460G
Resist coating and developing process technology toward EUV manufacturing sub 7nm node

Kamei, Yuya
;
Shiozawa, Takahiro
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Kawakami, Shinichiro
;
Shite, Hideo
;
Ichinomiya, Hiroshi
Proceedings paper
2018, International Symposium on Semiconductor Manufacturing (ISSM), 10/12/2018, p.1-4
Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Kamei, Yuya
;
Shiozawa, Takahiro
;
Kawakami, Shinichiro
;
Shite, Hideo
;
Ichinomiya, Hiroshi
Proceedings paper
2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.1014326