Browsing by Author "Smith, Bruce"
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Publication 3D Mask modeling for EUV lithography
Proceedings paper2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.832224Publication A method of image-based aberration metrology for EUVL tools
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 23/02/2015, p.942215Publication Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
Journal article2014, Journal of Vacuum Science and Technology B, (32) 6, p.06F801Publication Feasibility of compensating for EUV field edge effects through OPC
Proceedings paper2014, Extreme Ultraviolet (EUV) Lithography V, 23/02/2014, p.90480TPublication Gray bar masking: fabrication and imaging for 193 nm
Oral presentation2001, 21st Annual BACUS Symposium on Photomask Technology; October 2001; Monterey, CA, USA.Publication Mask-induced polarization effects at high NA
Proceedings paper2005-03, Optical Microlithography XVIII, 28/02/2005, p.555-566Publication Mitigating mask roughness via pupil filtering
Proceedings paper2014, Optical Microlithography XXVII, 23/02/2014, p.90521O