Browsing by Author "Smith, Mark D."
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Publication EUV secondary electron blur at the 22nm half pitch node
Proceedings paper2011, Extreme Ultravioet (EUV) Lithography II, 27/02/2011, p.796904Publication Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 3, p.33004Publication Impact of mask line roughness in EUV lithography
Proceedings paper2011, Extreme Ultraviolet (EUV) Lithography II, 27/02/2011, p.79691TPublication Investigation of interactions between metrology and lithography with a CD SEM simulator
Proceedings paper2014, Advances in Patterning Materials and Processes XXXI, 23/02/2014, p.905109Publication Mask absorber roughness impact in extreme ultraviolet lithography
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 2, p.23012Publication Understanding the impact of CD-SEM artifacts on metrology via experiments and simulations
Proceedings paper2015, Metrology, Inspection, and Process Control for Microlithography XXIX, 22/02/2015, p.94242A