Browsing by Author "Snee, Peter"
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Publication A novel resist and post-etch residue removal process using ozonated chemistries
Proceedings paper1998, IEEE VLSI Technology Symposium, 9/09/1998, p.168-169Publication A novel resist and post-etch residue removal process using ozonated chemistry
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.165-168Publication A novel resist and post-etch residue removal process using ozonated chemistry
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Cost-effective cleaning for advanced Si-processing
; ; ; Publication Development of a reduced cleaning process for application in a spray processor
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.149-52Publication Effect of Fe contamination on quality of poly silicon gate structures
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