Browsing by Author "Sofield, C. J."
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Publication Critical processes for ultra-thin gate oxide integrity
;Depas, Michel; ;Nigam, Tanya; ; ;Wilhelm, H.Wilhelm, RudiProceedings paper1996, Proceedings of the 3rd International Symposium on the Physics and Chemistry of SiO2 and the SiO2 Interface, 5/05/1996, p.352-366Publication Microroughness of clean silicon surfaces and gate oxide breakdown
Meeting abstract1995, 26th IEEE Semiconductor Interface Specialists' Conference, 7/12/1995Publication Ultra thin gate oxide technology and reliability
Proceedings paper1996, Proceedings 5th International Symposium on Semiconductor Manufacturing - ISSM, 2/10/1996, p.208-211