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Browsing by Author "Sofield, C. J."

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    Critical processes for ultra-thin gate oxide integrity

    Depas, Michel
    ;
    Heyns, Marc  
    ;
    Nigam, Tanya
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    Kenis, Karine  
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    Sprey, Hessel  
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    Wilhelm, H.
    ;
    Wilhelm, Rudi
    Proceedings paper
    1996, Proceedings of the 3rd International Symposium on the Physics and Chemistry of SiO2 and the SiO2 Interface, 5/05/1996, p.352-366
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    Microroughness of clean silicon surfaces and gate oxide breakdown

    Depas, Michel
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    Crossley, A.
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    Vermeire, Bert
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    Mertens, Paul  
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    Sofield, C. J.
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    Heyns, Marc  
    Meeting abstract
    1995, 26th IEEE Semiconductor Interface Specialists' Conference, 7/12/1995
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    Ultra thin gate oxide technology and reliability

    Heyns, Marc  
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    Depas, Michel
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    Teerlinck, Ivo
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    Meuris, Marc  
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    Mertens, Paul  
    ;
    Vanhellemont, Jan
    Proceedings paper
    1996, Proceedings 5th International Symposium on Semiconductor Manufacturing - ISSM, 2/10/1996, p.208-211

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