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Browsing by Author "Storm, Arjen"

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    A new HF vapor native oxide removal process for cluster applications

    Sprey, Hessel  
    ;
    Storm, Arjen
    ;
    Maes, Jan  
    ;
    Granneman, E. H. A.
    ;
    Hendriks, Marton
    ;
    Röhr, Erika
    Proceedings paper
    1998, Proceedings of the Symposium on Contamination Free Manufacturing for Semiconductor Manufacturing; SEMICON West, 13/07/1998, p.J1-J10
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    A new HF vapor process for native oxide removal, suited for cluster applications

    Storm, Arjen
    ;
    Sprey, Hessel  
    ;
    Maes, Jan  
    ;
    Granneman, E.
    ;
    De Blank, Rene  
    ;
    Röhr, Erika
    ;
    Caymax, Matty  
    Proceedings paper
    1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.225-228
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    Electrical evaluation of the EPI/substrate interface quality after different in-situ and ex-situ low-temperature pre-epi cleaning methods

    Caymax, Matty  
    ;
    Decoutere, Stefaan  
    ;
    Röhr, Erika
    ;
    Vandervorst, Wilfried  
    ;
    Heyns, Marc  
    ;
    Sprey, Hessel  
    Oral presentation
    1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
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    Electrical evaluation of the EPI/substrate interface quality after different in-situ and ex-situ low-temperature pre-epi cleaning methods

    Caymax, Matty  
    ;
    Decoutere, Stefaan  
    ;
    Röhr, Erika
    ;
    Vandervorst, Wilfried  
    ;
    Heyns, Marc  
    ;
    Sprey, Hessel  
    Proceedings paper
    1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.237-240

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