Browsing by Author "Sturtevant, John"
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Publication Contour-quality assessment for OPC model calibration
Proceedings paper2009, Metrology, Inspection and Process Control for Microlithography XXIII, 22/02/2009, p.72722QPublication Effective use of aerial image metrology for calibration of OPC models
Publication High-precision contouring from SEM image in 32-nm lithography and beyond
Publication Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula
Proceedings paper2020, Extreme Ultraviolet (EUV) Lithography XI; 113230L (2020), 23/02/2020, p.113230L