High-precision contouring from SEM image in 32-nm lithography and beyond

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Author(s)

Shindo, Hiroyuki

;

Sugiyama, Akiyuki

;

Komuro, Hitoshi

;

;

Matsuoka, Ryoichi

;

Sturtevant, John

;

;

;

Fenger, Germain

;

De Bisschop, Peter

;

Van de Kerkhove, Jeroen

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1982 since deposited on 2021-10-18

Acq. date: 2025-10-23