Publication:

High-precision contouring from SEM image in 32-nm lithography and beyond

Date

2009
Proceedings Paper
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dc.contributor.authorShindo, Hiroyuki
dc.contributor.authorSugiyama, Akiyuki
dc.contributor.authorKomuro, Hitoshi
dc.contributor.authorHojyo, Yutaka
dc.contributor.authorMatsuoka, Ryoichi
dc.contributor.authorSturtevant, John
dc.contributor.authorDo, Thuy
dc.contributor.authorKusnadi, Ir
dc.contributor.authorFenger, Germain
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVan de Kerkhove, Jeroen
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.date.accessioned2021-10-18T03:00:34Z
dc.date.available2021-10-18T03:00:34Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16218
dc.source.beginpage72751F
dc.source.conferenceDesign for Manufacturability through Design-Process Integration III
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose; CA USA
dc.title

High-precision contouring from SEM image in 32-nm lithography and beyond

dc.typeProceedings paper
dspace.entity.typePublication
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