Browsing by Author "Sturtevant, John L."
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Publication Contour-based self-aligning calibration of OPC models
Proceedings paper2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382MPublication High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Publication High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
Publication Impact of illumination source symmetrization in OPC