Publication:
High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
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1945 since deposited on 2021-10-19
2last month
Acq. date: 2026-02-25
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Statistics
Views
1945 since deposited on 2021-10-19
2last month
Acq. date: 2026-02-25
Citations