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Browsing by Author "Sullivan, C."

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    Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k films

    Iacopi, Francesca
    ;
    Zistl, C.
    ;
    Jehoul, Christiane  
    ;
    Tokei, Zsolt  
    ;
    Le, Quoc Toan  
    ;
    Das, Arabinda
    Journal article
    2002, Microelectronic Engineering, (64) 1_4, p.351-360
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    Properties of mesoporous low-k MSSQ based film prepared using macromolecular porogen

    Baklanov, Mikhaïl
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    Jehoul, Christiane  
    ;
    Flannery, C. M.
    ;
    Moguilnikov, Konstantin
    ;
    Gore, R.
    Proceedings paper
    2002, Advanced Metallization Conference 2001, 9/10/2001, p.273-278

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