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Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k films
Publication:
Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k films
Date
2002
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Iacopi, Francesca
;
Zistl, C.
;
Jehoul, Christiane
;
Tokei, Zsolt
;
Le, Quoc Toan
;
Das, Arabinda
;
Sullivan, C.
;
Prokopowicz, G.
;
Gronbeck, D.
;
Gallagher, M.
;
Calvert, J.
;
Maex, Karen
Journal
Microelectronic Engineering
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1920
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1920
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations