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Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k films

Date

2002
Journal article
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dc.contributor.authorIacopi, Francesca
dc.contributor.authorZistl, C.
dc.contributor.authorJehoul, Christiane
dc.contributor.authorTokei, Zsolt
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorDas, Arabinda
dc.contributor.authorSullivan, C.
dc.contributor.authorProkopowicz, G.
dc.contributor.authorGronbeck, D.
dc.contributor.authorGallagher, M.
dc.contributor.authorCalvert, J.
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.date.accessioned2021-10-14T21:52:27Z
dc.date.available2021-10-14T21:52:27Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6421
dc.source.beginpage351
dc.source.endpage360
dc.source.issue1_4
dc.source.journalMicroelectronic Engineering
dc.source.volume64
dc.title

Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k films

dc.typeJournal article
dspace.entity.typePublication
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