Browsing by Author "Takeoka, S."
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Publication Dual-channel technology with Cap-free single metal gate for high performance CMOS in gate-first and gate-last integration
Proceedings paper2011, IEEE International Electron Devices Meeting - IEDM, 5/12/2011, p.654-657Publication High performance Si.45Ge.55 implant free quantum well FET featuring low temperature process, eSiGe stressor and transversal strain relaxation
Proceedings paper2011, IEEE International Electron Devices Meeting - IEDM, 5/12/2011, p.829-832