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High performance Si.45Ge.55 implant free quantum well FET featuring low temperature process, eSiGe stressor and transversal strain relaxation
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1886 since deposited on 2021-10-19
Acq. date: 2025-10-23
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1886 since deposited on 2021-10-19
Acq. date: 2025-10-23
Citations